| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus in which pollution due to a nozzle arm for holding a discharge head can be prevented, and to provide a cleaning method.SOLUTION: A nozzle arm 62 for holding a discharge head is moved, by means of a revolution drive unit 63, between a processing position above a substrate W and a standby position on the outside of a processing cup surrounding the substrate W. When the nozzle arm 62 used for cleaning the substrate W is located at the standby position, cleaning liquid is ejected obliquely downward from a shower nozzle 71 toward the nozzle arm 62. Three nozzle arms 62 are cleaned sequentially when they elevate or lower to traverse the flow of cleaning liquid ejected obliquely downward. Thereafter, the cleaning liquid adhering to the arm is dried by blowing nitrogen gas from a drying gas nozzle 76 toward the nozzle arm 62. |
