发明名称 |
Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment |
摘要 |
A method of manufacturing a microlens includes: forming on a transparent substrate a first film which has an etching rate higher than the transparent substrate, forming on the first film a mask in which a pit is provided at a position corresponding to a center of the microlens to-be-formed, and wet-etching the first film and the transparent substrate through the mask, to thereby excavate in the transparent substrate a non-spherical recess which defines a curved surface of the microlens.
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申请公布号 |
US7064901(B2) |
申请公布日期 |
2006.06.20 |
申请号 |
US20040889048 |
申请日期 |
2004.07.13 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
OZAWA NORIHIKO |
分类号 |
G02B27/10;G02B3/00;G02F1/1335;G03F7/00 |
主分类号 |
G02B27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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