发明名称 Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment
摘要 A method of manufacturing a microlens includes: forming on a transparent substrate a first film which has an etching rate higher than the transparent substrate, forming on the first film a mask in which a pit is provided at a position corresponding to a center of the microlens to-be-formed, and wet-etching the first film and the transparent substrate through the mask, to thereby excavate in the transparent substrate a non-spherical recess which defines a curved surface of the microlens.
申请公布号 US7064901(B2) 申请公布日期 2006.06.20
申请号 US20040889048 申请日期 2004.07.13
申请人 SEIKO EPSON CORPORATION 发明人 OZAWA NORIHIKO
分类号 G02B27/10;G02B3/00;G02F1/1335;G03F7/00 主分类号 G02B27/10
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