| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a suction device that removes residual liquid of relatively small amount from a substrate in an oil immersion lithographic device. <P>SOLUTION: The oil immersion lithographic device having a pump and a buffer volume configured to remove the residual liquid from the substrate is provided. The pump and buffer volume are configured to create sucking/cleaning gas stream near the substrate by sucking gas into the inside of the buffer volume. Exhaust can be performed by using only a moderate powered vacuum pump because a required gas applying time is extremely limited (normally, less than 5%). As an additional or a separate method, the buffer volume can be used as a back-up volume buffer configured to provide a gas vacuum suction, for example, if the function of a sucking supply is suspended. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
