发明名称 UNIFORMITY CORRECTION FOR LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a uniformity correction module having movable blades which are at least partly immersed in a fluid and having a sufficiently small difference between a refractive index of each blade and a refractive index of the fluid to prevent a significant reflection and a refraction at a surface of each blade. <P>SOLUTION: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, includes a plurality of movable blades arranged along each longer side of the illumination slit and a chamber containing a fluid. Here, the movable blades are at least partly immersed in the fluid, and the difference between a refractive index of each blade and a refractive index of the fluid is sufficiently small to prevent the significant reflection and the refraction at a surface of each blade. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006165581(A) 申请公布日期 2006.06.22
申请号 JP20050354272 申请日期 2005.12.08
申请人 ASML HOLDINGS NV 发明人 KREMER ALEXANDER;DIERICHS MARCEL MATHIJS T M;LOOPSTRA ERIK ROELOF
分类号 H01L21/027;G02B21/06;G03F7/20 主分类号 H01L21/027
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