| 摘要 |
PURPOSE:To provide a manufacturing method to obtain a perovskite type multiple oxide thin film directly on a substrate being a target without using such complicated processes as calcining, pulverizing and sintering from a material which may be a precursor of a perovskite type multiple oxide or its mixture. CONSTITUTION:From the precursor of the perovskite type multiple oxide, e.g. bis(oxalate)titanium oxide (IV) barium being one of barium titanate procursors, a barium titanate thin film is directly formed on the substrate by thermal plasma spray. |
