| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition for a dry film excellent in storage stability, and a dry film comprising the composition. <P>SOLUTION: The photosensitive composition for a dry film contains as essential components (A) a carboxylic photosetting resin obtained by reacting a reaction product of a bisphenol type epoxy compound (a) represented by formula (1) and an unsaturated group-containing monocarboxylic acid (b) with a polybasic acid anhydride (c), (B) a photopolymerization initiator and (C) a brominated epoxy resin, and optionally contains (D) an epoxy resin other than the brominated epoxy resin, (E) a photosetting monomer or oligomer and (F) a curing reaction catalyst. The dry film comprising the photosensitive composition is also provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
