发明名称 APERTURE FILTER AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an aperture filter wherein a phase step caused between optical thin films when the aperture filter is constituted by film-depositing a plurality of kinds of optical thin films on a glass substrate is reduced. <P>SOLUTION: The aperture filter 10 is formed by film-depositing a first optical thin film 12 in a region A (a first region) of the glass substrate 11 and film-depositing a second optical thin film 13 in a region B (a second region) of the glass substrate 11. The first and the second optical thin films 12 and 13 have thin film constitutions different from each other and the first optical thin film 12 film-deposited in the region A transmits light having 780 nm, 660 nm and 405 nm wavelengths with &ge;95% transmittance and the second optical thin film 13 film-deposited in the region B transmits light having 660 nm and 405 nm wavelengths with &ge;95% transmittance and transmits light having a 780 nm wavelength with &le;4% transmittance. After the first and the second optical thin films 12 and 13 are film-deposited, etching is performed for canceling the phase step. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006228306(A) 申请公布日期 2006.08.31
申请号 JP20050039075 申请日期 2005.02.16
申请人 EPSON TOYOCOM CORP 发明人 SETOGUCHI KAZUTOSHI;YOSHIDA KIYOKAZU;FURUSATO HIROYOSHI
分类号 G11B7/135;C23C14/06;G02B5/28;G11B7/22 主分类号 G11B7/135
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