发明名称 |
PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTRUCTION USING IMAGING PUPIL FILTERS |
摘要 |
A method and tool for generating reconstructed images that model the high NA effects of a lithography tool used to image patterns produced by a mask. Comparison of the reconstructed images with reference images characterize the mask. The method involves providing a mask reticle for inspection. Generating matrix values associated with a high NA corrective filter matrix that characterizes a high NA lithography system used to print from the mask. Illuminating the mask to produce a patterned illumination beam that is filtered with filters associated with the high NA corrective filter matrix elements to obtain a plurality of filtered beams that include raw image data that is processed to obtain a reconstructed image that is further processed and compared with reference images to obtain mask characterization information.
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申请公布号 |
US2008170774(A1) |
申请公布日期 |
2008.07.17 |
申请号 |
US20070669014 |
申请日期 |
2007.01.30 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
XIONG YALIN;SHI RUI-FANG |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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