发明名称 Material for Forming Electroless Plate and Method for Forming Electroless Plate Using the Same
摘要 A material for electroless plating shows good adhesion for a catalyst and does not cause delamination of a catalyst adhering layer from a non-conductive base material in a catalyst adhering step, development step or other step. In a material for electroless plating, having a catalyst adhering layer on a non-conductive base material, the catalyst adhering layer is formed from a hydrophilic and/or water-soluble resin containing hydroxyl group, and a curable layer formed from a resin having hydroxyl group and an isocyanate type compound is provided between the base material and the catalyst adhering layer. The catalyst adhering layer is preferably formed while isocyanate groups of the isocyanate type compound in the curable layer remain.
申请公布号 US2009075089(A1) 申请公布日期 2009.03.19
申请号 US20070224722 申请日期 2007.03.12
申请人 OHTA TETSUJI;WATANABE MITSUHIRO 发明人 OHTA TETSUJI;WATANABE MITSUHIRO
分类号 B32B27/08;B05D1/38 主分类号 B32B27/08
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