发明名称 Liquid ejecting head and liquid ejecting apparatus
摘要 A liquid ejecting head includes: a nozzle plate provided with nozzle openings; an actuator unit including a flow channel formation substrate in which pressure generation chambers are provided and piezoelectric actuators that cause a change in the pressure of the liquid within respective pressure generation chambers; a communication substrate in which communication channels that communicate between the pressure generation chambers and corresponding nozzle openings are provided; a first case member that is a frame member affixed to the communication substrate so that the actuator unit is disposed within the first case member and that, along with the actuator unit, forms a manifold that holds the liquid to be supplied to the pressure generation chambers; and a second case member that is affixed to the first case member and in which is formed an introduction channel that sends the liquid from the exterior to the manifold.
申请公布号 US9346266(B2) 申请公布日期 2016.05.24
申请号 US201514704449 申请日期 2015.05.05
申请人 Seiko Epson Corporation 发明人 Miyata Yoshinao
分类号 B41J2/045;B41J2/14 主分类号 B41J2/045
代理机构 Workman Nydegger 代理人 Workman Nydegger
主权项 1. A liquid ejecting head comprising: a plate comprising holes; a flow channel formation substrate comprising: a surface affixed to the plate, andpressure generation chambers, each pressure generation chamber in communication with one of the holes; a first case, discrete from the flow channel formation substrate, comprising a surface affixed to the plate, wherein the first case and the flow channel formation substrate are arranged to form a liquid holding portion, the liquid holding portion in communication with the pressure generation chambers; a second case affixed to a portion of the first case, wherein liquid is delivered to the liquid holding portion through an opening in the second case; and pressure generation units configured to cause changes in a pressure of liquid within the pressure generation chambers and eject the liquid through the holes, wherein the flow channel formation substrate is surrounded by the first case in a plane parallel to the plate.
地址 Tokyo JP