发明名称 Vortex diodes as effluent treatment devices
摘要 The present invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of waste water treatment. The present invention disclose vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduces Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of waste water effectively in effluent treatments.
申请公布号 US9422952(B2) 申请公布日期 2016.08.23
申请号 US201214351124 申请日期 2012.10.11
申请人 COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH 发明人 Ranade Vivek Vinayak;Kulkarni Amol Arvind;Bhandari Vinay Manoharrao
分类号 C02F1/72;F15D1/00;C02F1/34;C02F3/28;C02F9/00;F15C1/16;C02F1/52;C02F1/78;C02F3/02;C02F101/30;C02F103/28;C02F103/30;C02F103/32 主分类号 C02F1/72
代理机构 Knobbe, Martens, Olson & Bear, LLP 代理人 Knobbe, Martens, Olson & Bear, LLP
主权项 1. A vortex diode for effluent treatment, wherein said vortex diode comprises: i. a chamber provided with a single or multiple inlet as a tangential port, wherein a flow entering from the tangential port sets up a high resistance mode of operation; ii. a vortex stabilizer connected to the chamber, wherein said vortex stabilizer comprises a base with or without threads and an insert which lies within the chamber; the insert being symmetrical around axis of an axial port and being formed by revolving either a straight connecting line having slope or a curved line between a point on the axis of symmetry of the chamber and a point lying on the base opposite to the axial port; and iii. the axial port being provided in the chamber for discharging treated effluent water; wherein the vortex stabilizer has a diameter in a range of 10 to 40% of a diameter of the chamber and a height less than 15% of the diameter of the chamber.
地址 New Delhi IN