发明名称 Method for producing fluorine-containing alkane
摘要 The present invention provides a method for producing a fluorine-containing alkane, which comprises reacting at least one fluorine-containing compound selected from the group consisting of chlorine-containing fluoroalkanes and fluorine-containing alkenes with hydrogen gas in the presence of catalysts, wherein two or more catalysts having different catalytic activities are used, and the fluorine-containing compound and hydrogen gas, which are starting materials, are sequentially brought into contact with the catalysts in the order of the catalyst having a lower catalytic activity followed by the catalyst having a higher catalytic activity. According to the present invention, in the method for producing a fluorine-containing alkane by using chlorine-containing fluoroalkane or fluorine-containing alkene as a starting material, and subjection it to a reduction reaction or a hydrogen addition reaction, the objective fluorine-containing alkane can be produced with high productivity.
申请公布号 US9428429(B2) 申请公布日期 2016.08.30
申请号 US201113634047 申请日期 2011.02.18
申请人 DAIKIN INDUSTRIES, LTD. 发明人 Shiotani Yuko;Hanabusa Kakeru;Chaki Takehiro;Takahashi Kazuhiro
分类号 C07C17/354;C07C17/23 主分类号 C07C17/354
代理机构 Wenderoth, Lind & Ponack, L.L.P. 代理人 Wenderoth, Lind & Ponack, L.L.P.
主权项 1. A method for producing fluorine-containing alkane comprising reacting at least one chlorine-containing fluoroalkane with hydrogen gas in the presence of catalysts having different catalytic activities, wherein the catalysts having different catalytic activities are: those containing Pd supported on activated carbon with different supporting amounts; or those made by mixing Pd supported on activated carbon with an activated carbon to dilute it in different dilution rates, and wherein the at least one chlorine-containing fluoroalkane and hydrogen gas, which are starting materials, are sequentially contacted with a catalyst containing a smaller amount of Pd to a catalyst containing a larger amount of Pd.
地址 Osaka JP