| 摘要 |
A MOS fuse with programmable tunnel oxide breakdown is made up of a tunnel oxide EEPROM cell, which can be programmed/erased by a programming/erasure voltage having a slow-rising edge, while the tunnel oxide can be subjected to breakdown, when desired, by switching over to a programming/erasure voltage having a steep edge. Such fuse can be used in all MOS integrated circuits and particularly in memory card type applications.
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