| 发明名称 |
Aqueous developable deep UV negative resist |
| 摘要 |
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) a photoactive benzennelated acetic acid selected from formula (I): <IMAGE> (I) wherein X is either an oxygen, sulfur or -C-H2.
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| 申请公布号 |
US5258260(A) |
申请公布日期 |
1993.11.02 |
| 申请号 |
US19920980076 |
申请日期 |
1992.11.23 |
| 申请人 |
OLIN CORPORATION |
发明人 |
SLATER, SYDNEY G.;FICNER, STANLEY A. |
| 分类号 |
G03F7/038;(IPC1-7):G03C1/492 |
主分类号 |
G03F7/038 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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