摘要 |
<p>PURPOSE:To form a uniform film by obtaining electric continuity between a holder on which a wafer is mounted downward and aluminum on the wafer surface. CONSTITUTION:In order to obtain electic continuity between a holder 1 and a wafer 2, the contact part of an orientation flat part 5 of the holder is made large, so that aluminum on the wafer surface comes into contact with the holder 1, and electric continuity is obtained. Thereby uniform plasma discharge is generated, and a uniform film is formed.</p> |