发明名称 PLASMA CVD EQUIPMENT AND FORMATION OF FILM BY USE OF SAME
摘要 <p>PURPOSE:To form a uniform film by obtaining electric continuity between a holder on which a wafer is mounted downward and aluminum on the wafer surface. CONSTITUTION:In order to obtain electic continuity between a holder 1 and a wafer 2, the contact part of an orientation flat part 5 of the holder is made large, so that aluminum on the wafer surface comes into contact with the holder 1, and electric continuity is obtained. Thereby uniform plasma discharge is generated, and a uniform film is formed.</p>
申请公布号 JPH0750262(A) 申请公布日期 1995.02.21
申请号 JP19930193395 申请日期 1993.08.04
申请人 NEC YAMAGATA LTD 发明人 SHIRAHATA KAZUHIRO
分类号 C23C16/50;C23C16/52;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 主分类号 C23C16/50
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