发明名称 METHOD OF FORMING METAL WIRING AND METHOD OF MANUFACTURING ACTIVE MATRIX SUBSTRATE
摘要 A method for forming metal wiring and a method for manufacturing an active matrix substrate are provided to form a conductive layer by starting the heating of a coated solution including fine metal particles and a dispersion stabilizer within a predetermined time after coating the solution on the underlayer, thereby improving the degree of contact of a conductive layer. A method for forming metal wiring comprises the following steps of: forming an underlayer(F1) on a substrate; coating a solution including fine metal particles and a dispersion stabilizer on the underlayer; and heating the coated solution to form a conductive layer(F2). After coating the solution on the underlayer, the conductive layer is formed by starting the heating of the coated solution within a predetermined time.
申请公布号 KR20070094481(A) 申请公布日期 2007.09.20
申请号 KR20070024639 申请日期 2007.03.13
申请人 SEIKO EPSON CORPORATION 发明人 NODA YOICHI
分类号 G02F1/13;G02F1/136;G02F1/1368;H01J9/02;H01J11/22;H01J11/34;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L29/423;H01L29/49;H01L29/786;H05K1/02 主分类号 G02F1/13
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