| 摘要 |
Cleaning solution is provided to remove organic impurities or particles efficiently without the corrosion of metal, in washing a semiconductor exposed with aluminium or aluminium alloy, or a substrate for manufacturing a flat panel display device. Cleaning solution comprises alkanolamine 0.05~5 weight%, ammonium salt 0.1~10 weight%, glycolether 10~70 weight% and the residual amount of water. The alkanolamine is one or a mixture of two or more selected from a group consisting of monoethanolamine, diethanolamine, triethanolamine, methyldiethanolamine, 2-(ethylamino)ethanol, 2-(methylamino)ethanol, dimethylaminoethanol, diethylaminoethanol, 2-(2-aminoethoxy)ethanol, 1- amino-2-propanol, monopropanolamine, monoisopropanolamine and dibutanolamine. |
