发明名称 Semiconductor device including a resistor metallic layer and method of forming the same
摘要 A semiconductor device including a resistor metallic layer and method forming the same. In one embodiment, the semiconductor device includes a source region and a drain region of a semiconductor switch on a substrate. The semiconductor device also includes the resistor metallic layer over the source region and the drain region of the semiconductor switch. The resistor metallic layer includes a first resistor with a first resistor metallic strip coupled between a first cross member and a second cross member of the resistor metallic layer.
申请公布号 US9508785(B1) 申请公布日期 2016.11.29
申请号 US201514671956 申请日期 2015.03.27
申请人 Altera Corporation 发明人 Lopata Douglas Dean;Demski Jeffrey;Norton Jay;Rojas-Gonzales Miguel
分类号 H01L27/06;H01L49/02 主分类号 H01L27/06
代理机构 Fletcher Yoder, P.C. 代理人 Fletcher Yoder, P.C.
主权项 1. A semiconductor device, comprising: a source region and a drain region of a semiconductor switch on a substrate; and a resistor metallic layer over said source region and said drain region of said semiconductor switch, said resistor metallic layer comprising a first resistor including a first resistor metallic strip coupled between a first cross member and a second cross member.
地址 San Jose CA US