发明名称 |
Semiconductor device including a resistor metallic layer and method of forming the same |
摘要 |
A semiconductor device including a resistor metallic layer and method forming the same. In one embodiment, the semiconductor device includes a source region and a drain region of a semiconductor switch on a substrate. The semiconductor device also includes the resistor metallic layer over the source region and the drain region of the semiconductor switch. The resistor metallic layer includes a first resistor with a first resistor metallic strip coupled between a first cross member and a second cross member of the resistor metallic layer. |
申请公布号 |
US9508785(B1) |
申请公布日期 |
2016.11.29 |
申请号 |
US201514671956 |
申请日期 |
2015.03.27 |
申请人 |
Altera Corporation |
发明人 |
Lopata Douglas Dean;Demski Jeffrey;Norton Jay;Rojas-Gonzales Miguel |
分类号 |
H01L27/06;H01L49/02 |
主分类号 |
H01L27/06 |
代理机构 |
Fletcher Yoder, P.C. |
代理人 |
Fletcher Yoder, P.C. |
主权项 |
1. A semiconductor device, comprising:
a source region and a drain region of a semiconductor switch on a substrate; and a resistor metallic layer over said source region and said drain region of said semiconductor switch, said resistor metallic layer comprising a first resistor including a first resistor metallic strip coupled between a first cross member and a second cross member. |
地址 |
San Jose CA US |