| 摘要 |
In a step (A), a selectively removable resist layer or a selectively removable sacrifice layer is formed in a predetermined pattern in a protrusion non-forming region on a base plate. In a step (B), a pillar-shaped structure film is formed on a side of the base plate, on which side the resist layer or the sacrifice layer has been formed in the predetermined pattern. The pillar-shaped structure film contains a plurality of pillar-shaped bodies, each of which extends in a direction nonparallel with a base plate surface of the base plate. In a step (C), the resist layer or the sacrifice layer, and a region of the pillar-shaped structure film, which region is located on the resist layer or the sacrifice layer, are removed by use of a lift-off technique. At least one protruding region, which contains the pillar-shaped bodies, is thus formed.
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