| 摘要 |
PROBLEM TO BE SOLVED: To provide a discharge plasma processor and a processing method using the same which continuously and stably generates a uniform glow discharge plasma substantially under the atmospheric pressure to form a thin film, using not only a single process gas but a plurality of process gases, and can deal with complicated processes in etching, ashing steps, etc. SOLUTION: The discharge plasma processor comprises three or more electrodes forming two or more discharge spaces and a solid dielectric covering at least one of opposed surfaces of the electrodes forming the discharge spaces, so that applying an electric field between the opposed electrodes causes a discharge plasma to be generated under a pressure near the atmospheric pressure. |
