| 摘要 |
<P>PROBLEM TO BE SOLVED: To neutralize a quencher from a resist layer by a coating material to reduce activity and fluidity of the quencher, which significantly reduces the possibility of the quencher in the resist to diffuse into water drops, and thereby, prevents production of a watermark. <P>SOLUTION: A coating material layer 130 contains an acid 134 capable of neutralizing a base quencher 124 from a photo sensitive layer, and a polymer 132 as a carrier of the acid 134 and insoluble in an immersion fluid used in an immersion lithography process. The acid 134 is chemically bonded to the polymer 132. The acid 134 contains an organic acid. <P>COPYRIGHT: (C)2007,JPO&INPIT |
