| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thermosetting composition capable of effectively suppressing diffused reflection light from a substrate in an exposure step for forming a color filter or a micro-lens, having high heat-resistance and suitable for forming an antihalation film free from the generation of roughening defect of the film even by dry etching, a method for forming an antihalation film by using the composition, an antihalation film produced by the method and a solid-state imaging device having the antihalation film. <P>SOLUTION: The thermosetting composition contains a copolymer of a polymerizable unsaturated compound having oxiranyl group or oxetanyl group and other polymerizable unsaturated compound, and a specific benzophenone-based radiation absorbing agent such as 2,4,2',4'-tetrahydroxybenzophenone. <P>COPYRIGHT: (C)2007,JPO&INPIT |
