| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system capable of detecying foreign matters in a film deposition treatment chamber and stopping the opening/closing operation of an upper coveregardless of the opening/closing operation and the opening/closing position of the upper cover, thereby enhancing operator's safety when opening/closing the upper cover. SOLUTION: The film deposition system is equipped with: a film deposition treatment chamber; an upper cover opening/closing mechanism for opening/closing the upper cover of the film deposition treatment chamber; an image pickup unit for picking-up the image of the opening/closing of the upper cover; an image processing circuit for subjecting an image acquired by the image pickup unit to image processing; and an interlock circuit for controlling the operation of the upper cover opening/closing mechanism. The image processing circuit detects foreign matter from the image acquired by the image pickup unit. The interlock circuit stops the operation of the upper cover opening/closing mechanism based on foreign matter detection by the image processing circuit. The image processing circuit performs image processing of removing the images of the film deposition treatment chamber and the upper cover from the images picked up by the image pickup unit, thus, in the case foreign matter is present, only the image of the foreign matter is extracted, and, from the image, the presence of the foreign matter is discriminated. COPYRIGHT: (C)2008,JPO&INPIT
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