发明名称 |
PLASMA APPARATUS AND SYSTEM |
摘要 |
A plasma apparatus including a first anode plasma head and a first cathode plasma head. Each of the plasma heads including an electrode, a plasma flow channel, and a primary gas inlet disposed between at least a portion of said plasma flow channel. The first anode plasma head and the first cathode plasma head being disposed at angle relative to one another. The plasma apparatus also including a second anode plasma head and a second cathode plasma head. Each of the plasma heads including an electrode, a plasma flow channel, and a primary gas inlet disposed between at least a portion of the electrode, the plasma flow channel, the second anode plasma head and the second cathode plasma head being disposed at an angle relative to one another. |
申请公布号 |
WO2008067292(A3) |
申请公布日期 |
2008.07.17 |
申请号 |
WO2007US85606 |
申请日期 |
2007.11.27 |
申请人 |
BELASHCHENKO, VLADIMIR E.;SOLONENKO, OLEG P.;SMIRNOV, ANDREY V. |
发明人 |
BELASHCHENKO, VLADIMIR E.;SOLONENKO, OLEG P.;SMIRNOV, ANDREY V. |
分类号 |
B44C1/22;B23K10/00 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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