发明名称 PLASMA APPARATUS AND SYSTEM
摘要 A plasma apparatus including a first anode plasma head and a first cathode plasma head. Each of the plasma heads including an electrode, a plasma flow channel, and a primary gas inlet disposed between at least a portion of said plasma flow channel. The first anode plasma head and the first cathode plasma head being disposed at angle relative to one another. The plasma apparatus also including a second anode plasma head and a second cathode plasma head. Each of the plasma heads including an electrode, a plasma flow channel, and a primary gas inlet disposed between at least a portion of the electrode, the plasma flow channel, the second anode plasma head and the second cathode plasma head being disposed at an angle relative to one another.
申请公布号 WO2008067292(A3) 申请公布日期 2008.07.17
申请号 WO2007US85606 申请日期 2007.11.27
申请人 BELASHCHENKO, VLADIMIR E.;SOLONENKO, OLEG P.;SMIRNOV, ANDREY V. 发明人 BELASHCHENKO, VLADIMIR E.;SOLONENKO, OLEG P.;SMIRNOV, ANDREY V.
分类号 B44C1/22;B23K10/00 主分类号 B44C1/22
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