| 发明名称 |
APPARATUS AND METHOD FOR MEASURING DEPOSITION RATE |
| 摘要 |
An apparatus for measuring a deposition rate includes a light source unit in a deposition region between a deposition source and a substrate in a vacuum chamber, the light source unit emits a monochromatic light toward a deposition material released from the deposition source, a photosensor unit that measures at least one of light absorption, scattering, and emission in the deposition region when light emitted from the light source unit passes through the deposition region, and a multi-pass forming unit defining a multi-pass path between the light source unit and the photosensor unit. |
| 申请公布号 |
US2016245745(A1) |
申请公布日期 |
2016.08.25 |
| 申请号 |
US201514860888 |
申请日期 |
2015.09.22 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
KANG Tae Min;LEE Seung Mook;CHO Young Suk |
| 分类号 |
G01N21/53;G01F1/00 |
主分类号 |
G01N21/53 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for measuring a deposition rate, comprising:
a light source unit in a deposition region between a deposition source and a substrate in a vacuum chamber, the light source unit emits a monochromatic light toward a deposition material released from the deposition source; a photosensor unit that measures at least one of light absorption, scattering, and emission in the deposition region when light emitted from the light source unit passes through the deposition region; and a multi-pass forming unit defining a multi-pass path between the light source unit and the photosensor unit. |
| 地址 |
Yongin-si KR |
