发明名称 |
Use of calcium fluoride substrate for lithography masks |
摘要 |
Photolithographic masks and nano-imprint lithography masks with calcium fluoride substrates are disclosed. A photolithographic mask has a calcium fluoride substrate having a surface, a patterned layer disposed on the surface, and a polymer layer forming a pellicle that covers the patterned layer. A mask for nano-imprint lithography has a calcium fluoride substrate with a surface and a nano-imprint lithography pattern formed on the surface. Such masks can be used in a method for reducing the effects of hydration during lithography. In the method a layer of photoresist is formed on a substrate. A mask having a substrate made of calcium fluoride with a patterned surface is disposed proximate the layer of photoresist. The photoresist is exposed to radiation that passes through the mask. The radiation is characterized by a vacuum wavelength between about 190 nm and about 450 nm. Calcium fluoride masks can also be used to reduce the effects of hydration nano-imprint lithography.
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申请公布号 |
US7541115(B1) |
申请公布日期 |
2009.06.02 |
申请号 |
US20050075993 |
申请日期 |
2005.03.09 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
VOLK WILLIAM;WAGNER LAURENCE |
分类号 |
G03F1/00;G03C5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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