发明名称 |
RETICLE TRANSPORT DEVICE, INSPECTION DEVICE AND RETICLE TRANSPORT METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a reticle transport device capable of facilitating inspection of a reticle with the use of an inspection device.SOLUTION: A reticle transport device 10 for transporting a reticle for EUV lithography (EUVL) comprises: an inner pot take-out part 12 for taking out an inner pod stored in an outer pod; a reticle take-out part 13 for taking out the reticle stored in the inner pod; and an application part installation part for installing an application part capable of applying electric power, on an upper face or outer periphery of the reticle.SELECTED DRAWING: Figure 3 |
申请公布号 |
JP2016170310(A) |
申请公布日期 |
2016.09.23 |
申请号 |
JP20150050632 |
申请日期 |
2015.03.13 |
申请人 |
EBARA CORP |
发明人 |
TSUKAMOTO KIWAMU;HATAKEYAMA MASAKI |
分类号 |
G03F1/84;B65G49/00;B65G49/06;G03F1/24;G03F1/66;G03F7/20;H01L21/673;H01L21/677 |
主分类号 |
G03F1/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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