发明名称 RETICLE TRANSPORT DEVICE, INSPECTION DEVICE AND RETICLE TRANSPORT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a reticle transport device capable of facilitating inspection of a reticle with the use of an inspection device.SOLUTION: A reticle transport device 10 for transporting a reticle for EUV lithography (EUVL) comprises: an inner pot take-out part 12 for taking out an inner pod stored in an outer pod; a reticle take-out part 13 for taking out the reticle stored in the inner pod; and an application part installation part for installing an application part capable of applying electric power, on an upper face or outer periphery of the reticle.SELECTED DRAWING: Figure 3
申请公布号 JP2016170310(A) 申请公布日期 2016.09.23
申请号 JP20150050632 申请日期 2015.03.13
申请人 EBARA CORP 发明人 TSUKAMOTO KIWAMU;HATAKEYAMA MASAKI
分类号 G03F1/84;B65G49/00;B65G49/06;G03F1/24;G03F1/66;G03F7/20;H01L21/673;H01L21/677 主分类号 G03F1/84
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