| 摘要 |
Chemical compositions are presented that provide an increased rate of processing in a photolithography process in which a bleachable layer on top of a photoresist is bleached to produce a contact mask and then the photoresist is exposed through this contact mask. These compositions have increased oxygen permeability and increased solubility for a bleachable dye. Also, a class of dyes is presented that increase the process speed.
|
