| 摘要 |
PURPOSE: To enable exposure with radiation and development with an existing developing device by incorporating alkali-soluble phenolic resin, specified poly(siloxane) and a specified acid generating agent. CONSTITUTION: Alkali-soluble phenolic resin, poly(siloxane) having a C-O-Si bond per one monomer unit and an acid generating agent which is degraded by the action of radiation and generates an acid are incorporated. Since the poly(siloxane) has water repellency, the resultant radiation sensitive resin compsn. has action to inhibit the dissolution of the phenolic resin in an aq. alkali soln. Since the poly(siloxane) has such a property that alkoxyl groups in the poly(siloxane) are readily released by an acid and hydroxyl groups are substd. for the alkoxyl groups, hydroxyl groups (silanol) are substd. for the side chains of released alkoxyl groups and a silanol-rich polymer is formed. When the radiation sensitive resin compsn. is irradiated, an acid is generated from the acid generating agent contained in the compsn. |
