发明名称 |
EPROM in double poly high density CMOS |
摘要 |
A method of making an EPROM transistor in a high density CMOS integrated circuit having a poly to poly capacitor and including two layers of polysilicon. The EPROM transistor is made using only the steps used to make the other components of the high density CMOS integrated circuit. The EPROM transistor is programmable at the low voltages which high density CMOS transistors can handle. |
申请公布号 |
US5872034(A) |
申请公布日期 |
1999.02.16 |
申请号 |
US19970963489 |
申请日期 |
1997.11.03 |
申请人 |
DELCO ELECTRONICS CORPORATION |
发明人 |
SCHLAIS, JOHN ROBERT;RUSCH, RANDY ALAN |
分类号 |
H01L21/8247;H01L27/06;H01L27/105;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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