发明名称 SPUTTER ION PUMP WHICH HAS IMPROVED MAGNET ASSEMBLY
摘要 PROBLEM TO BE SOLVED: To provide a sputter ion pump capable of providing satisfactory pumping speeds even at low pressures, while having limited overall size and weight. SOLUTION: The sputter ion pump 1 has an improved magnet assembly comprising main magnets 9a, 9b disposed on both end parts of the pump cells of an anode, and auxiliary magnets 11; 11', 11" disposed on one side only of the pump cells, whereby the assembly exhibits an asymmetrical configuration. The sputter ion pump with the improved magnet assembly allows for attaining high pumping speeds even at low pressures while size, weight, and manufacturing cost of the pump itself are being suppressed. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007324134(A) 申请公布日期 2007.12.13
申请号 JP20070145763 申请日期 2007.05.31
申请人 VARIAN SPA 发明人 BONMASSAR LUCA;MURA MICHELE
分类号 H01J41/12 主分类号 H01J41/12
代理机构 代理人
主权项
地址