| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner that can favorably compound images of patterning regions of a mask on a substrate without being affected by bending of the mask. <P>SOLUTION: The aligner includes a light source 1, an illumination optical system IL guiding illumination light emitting from the light source 1 onto a mask, and a mask mounting unit mounting the mask M and transfers a pattern formed in the mask M onto a substrate P. The aligner includes a dimming member 9a that is disposed between the light source 1 and the mask M and generates a dimmed portion where the luminous energy of illumination light is continuously decreased in a part of the region where the pattern is formed; and a control unit that controls a distance between the dimming member 9a and the mask M or a conjugate plane optically conjugate with the mask M in the illumination optical system IL, based on the mask profile in a direction intersecting the plane of the mask M when the mask M is mounted on the mask mounting unit: and the pattern of the mask M illuminated by the illumination optical system IL using the dimming member 9a controlled by the control section is transferred onto the substrate P. <P>COPYRIGHT: (C)2008,JPO&INPIT |
