RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION COMPOSED OF ORGANIC NICKEL COMPOUND AND CHEMICAL VAPOR DEPOSITION METHOD USING THE RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a raw material for chemical vapor deposition mainly containing an organic nickel compound and enabling high purity nickel thin film to be deposited without using a reaction gas.SOLUTION: The raw material for chemical vapor deposition is provided which is composed of an organic nickel compound and is for use in forming a nickel thin film or a nickel compound thin film by a chemical vapor deposition, and in which the organic nickel compound is an organic nickel compound represented by the following formula and having cyclooctadiene and an acetylene derivative coordinated to nickel with zero valence. In the formula, Xand Xare substituents having 3 to 13 carbon atoms and a trialkylsilyl group, a trialkylmethyl group or the like can be applied.SELECTED DRAWING: Figure 3