发明名称 APPARATUS FOR PREPARING STANDARD SOLUTION FOR SEMICONDUCTOR WATER QUALITY ANALYZING FACILITY
摘要 <p>PROBLEM TO BE SOLVED: To prevent a standard solution from being contaminated by providing a first line which can be tightly coupled to any one of through-holes and supply a purge gas to a preparation tank, a second line which can supply a dense standard solution and a solvent for diluting a standard solution, and a third line which can discharge the diluted standard solution. SOLUTION: A pressure regulator 28 and a valve 30 are set on a first line 26 based on a flow of a purge gas. A flow rate to be supplied is regulated by the regulator 28. A second line 36 is inserted to a standard solution feed opening 18, tightly sealed and coupled by a packing 32 and fixed through coupling of a fixing member 34 and an external tank via a screw. A valve 38 which can open/close the line is set at an upper part of the second line 36. A third line 42 is inserted to a standard solution discharge opening 16, tightly sealed and coupled by the packing 32 and fixed through coupling of the fixing member 34 and external tank via a screw. A valve 44, a pump 40 are set on the third line 42.</p>
申请公布号 JPH1090129(A) 申请公布日期 1998.04.10
申请号 JP19970112767 申请日期 1997.04.30
申请人 SAMSUNG ELECTRON CO LTD 发明人 GO INTETSU;KYO ZENNAN
分类号 G01N1/00;B01J19/00;G01N33/18;(IPC1-7):G01N1/00 主分类号 G01N1/00
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