发明名称 METHOD AND APPARATUS FOR THE PRODUCTION OF A STRUCTURE BY FOCUSED LASER RADIATION ON A PHOTOSENSITIVELY COATED SUBSTRATE
摘要 This invention relates to a method for writing on a photosensitive surface a pattern described in input data by scanning at least one modulated laser beam in parallel scan lines while moving along scan stripes in a direction perpendicular to the scan lines. The method comprising the steps of dividing said input data into partially overlapping stripe pattern data corresponding to scan stripes having stripe overlap regions, providing a predetermined exposure blend function along the scan line, said blend function starting and ending with a 0 % value and further having a 100 % value near the center of the scan line, and modulating the laser beam with the product of the exposure blend function and the stripe pattern data. The invention also includes an apparatus for writting patterns according to the above mentioned method.
申请公布号 EP0956516(A1) 申请公布日期 1999.11.17
申请号 EP19970908608 申请日期 1997.01.29
申请人 MICRONIC LASER SYSTEMS AB 发明人 SANDSTROEM, TORBJOERN;THUREN, ANDERS
分类号 G03F1/76;G03F7/20;H01L21/027;H04N1/10 主分类号 G03F1/76
代理机构 代理人
主权项
地址