发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having very superior sensitivity, adhesion, chemical resistance, flexibility and contamination property with respect to a plating bath, and to provide a method for producing a printed wiring board using the composition. SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound, having at least one polymerizable ethylenically unsaturated group in one molecule and (C1) a coumarin derivative of formula (I) and (C2) a boron salt compound of formula (II) as (C) a photopolymerization initiator system. The photosensitive resin composition is applied and dried on a base and a protective film is optionally disposed, to obtain the objective photosensitive element. The photosensitive element is sued in the method for producing a printed wiring board.
申请公布号 JP2002156756(A) 申请公布日期 2002.05.31
申请号 JP20010283671 申请日期 2001.09.18
申请人 HITACHI CHEM CO LTD 发明人 NATORI MICHIKO
分类号 G03F7/031;C08F2/44;C08F2/50;C08F291/00;G03F7/004;G03F7/027;G03F7/029;G03F7/033;H05K3/00 主分类号 G03F7/031
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