发明名称 VALVE CONTROL SYSTEM FOR SEMICONDUCTOR TREATMENT CHAMBER
摘要 PROBLEM TO BE SOLVED: To provide a valve control system for a semiconductor treatment chamber. SOLUTION: This valve control system 10 is provided with a system control computer 18, and a plurality of valves 12 which are related to a treatment chamber and electrically controlled. Further, the system 10 has a programmable logic controller(PLC) 20 which communicates with the system control computer 18 and operationally connected with the electrically controlled valves 12. Refresh time for controlling the valves is at most 10 msec. As a result, controlling operation of the valves does not make the time and term which are necessary for very fast repetition cycles in a deposition process of an atom layer remarkably. A hardware interlock 34 is realized by an output power source(PS) 32 of the programmable logic controller 20.
申请公布号 JP2002329674(A) 申请公布日期 2002.11.15
申请号 JP20020109810 申请日期 2002.03.07
申请人 APPLIED MATERIALS INC 发明人 LU SIQING;CHANG YU;SUN DONGXI;DANG VINH;YANG MICHAEL X;CHANG ANZHONG;NGUYEN ANH N;MIN SHI
分类号 C23C16/52;G05D7/06;H01L21/02;H01L21/205 主分类号 C23C16/52
代理机构 代理人
主权项
地址