发明名称 VERFAHREN ZUR STRUKTURIERUNG EINES FUNKTIONALEN MATERIALS AUF EIN SUBSTRAT
摘要 A method of patterning a functional material onto a substrate (200) comprises the steps of (a) applying a layer of functional material (225) to at least one major surface of said substrate; (b) applying a layer of protective material (230), soluble in a solvent in which the functional material (225) is insoluble, over said layer of functional material; (c) removing areas of said layers of protective (230) and functional (225) materials in well-defined regions on the substrate; and (d) removing the remaining exposed protective material (230) from the substrate (200) by dissolution in said solvent.
申请公布号 AT390720(T) 申请公布日期 2008.04.15
申请号 AT20050734213T 申请日期 2005.04.14
申请人 EXITECH LIMITED 发明人 BUCKLEY, ALASTAIR ROBERT;GIEBELER, CARSTEN;VOIGT, MONIKA;LIDZEY, DAVID GEORGE;BOEHLEN, KARL LUKAS;FIERET, JACOB
分类号 H01L51/40;H01L27/32;H01L51/00;H01L51/50;H01L51/56 主分类号 H01L51/40
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