发明名称 |
VERFAHREN ZUR STRUKTURIERUNG EINES FUNKTIONALEN MATERIALS AUF EIN SUBSTRAT |
摘要 |
A method of patterning a functional material onto a substrate (200) comprises the steps of (a) applying a layer of functional material (225) to at least one major surface of said substrate; (b) applying a layer of protective material (230), soluble in a solvent in which the functional material (225) is insoluble, over said layer of functional material; (c) removing areas of said layers of protective (230) and functional (225) materials in well-defined regions on the substrate; and (d) removing the remaining exposed protective material (230) from the substrate (200) by dissolution in said solvent. |
申请公布号 |
AT390720(T) |
申请公布日期 |
2008.04.15 |
申请号 |
AT20050734213T |
申请日期 |
2005.04.14 |
申请人 |
EXITECH LIMITED |
发明人 |
BUCKLEY, ALASTAIR ROBERT;GIEBELER, CARSTEN;VOIGT, MONIKA;LIDZEY, DAVID GEORGE;BOEHLEN, KARL LUKAS;FIERET, JACOB |
分类号 |
H01L51/40;H01L27/32;H01L51/00;H01L51/50;H01L51/56 |
主分类号 |
H01L51/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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