发明名称 |
Device and method for maskless AFM microlithography |
摘要 |
The invention relates to a device and a method for maskless microlithography. Several microstructured cantilevers ( 2 ) are arranged in an array ( 26 ) and an actuator is integrated in each of the cantilevers ( 2 ) of the array ( 26 ). A power supply and control unit ( 24 ) is provided, said unit adjusting the distance of the cantilevers ( 6 ) relative to a surface ( 4 ) that is to be structured by means of an appropriate voltage. Every point of the needles ( 6 ) is connected to said power supply and control unit ( 24 ). In order to implement the inventive method, an array ( 26 ) with cantilevers, each of which carries a point of a needle ( 6 ), is brought into contact with a surface ( 4 ) to be structured in such a way that the points of the needles ( 6 ) are arranged close to the surface ( 4 ) to be structured.
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申请公布号 |
US7141808(B2) |
申请公布日期 |
2006.11.28 |
申请号 |
US20050508478 |
申请日期 |
2005.04.20 |
申请人 |
RANGELOW IVO;IVANOV TZWETAN;HUDEK PETER;FORTAGNE OLAF |
发明人 |
RANGELOW IVO;IVANOV TZWETAN;HUDEK PETER;FORTAGNE OLAF |
分类号 |
H01J37/30;G01Q80/00;G11B9/00;H01J37/317 |
主分类号 |
H01J37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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