| 摘要 |
A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil or the array of individually controllable elements is imaged onto a target portion of the substrate. The projection system includes an array of lenses with each lens in the array arranged to direct a respective part of the patterned beam onto a respective part of the target portion of the substrate. In one example, each of the individually controllable elements is selectively controllable to direct a respective part of the beam away from the pupil such that the proportion of the bean passing through the pupil is adjusted. In one example, the individually controllable elements are arranged in groups, such that radiation deflected by each element in one group is directed towards the same lens in the lens array. In one example, the individually controllable elements in any one group are controlled together to direct radiation in different directions away from the pupil, such that the pattern imparted to the beam by that group of elements is substantially symmetrical with respect to the pupil.
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