发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition having low elasticity, high heat resistance, and high resolution. <P>SOLUTION: The positive photosensitive resin composition comprises: (A) a polyamic acid; (B) a 1,4-dihydropyridine derivative represented by general formula (II), wherein R<SP>2</SP>represents a monovalent organic group, each of R<SP>3</SP>, R<SP>4</SP>, R<SP>5</SP>, R<SP>6</SP>independently represents hydrogen or a monovalent organic group, and Ar-NO<SB>2</SB>represents an aromatic hydrocarbon group having a nitro group at the ortho-position; and (C) an amine compound. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006285193(A) 申请公布日期 2006.10.19
申请号 JP20050306078 申请日期 2005.10.20
申请人 NITTO DENKO CORP 发明人 FUJII HIROFUMI;SAITO MAKOTO;ONISHI KENJI
分类号 G03F7/037;G03F7/004;G03F7/075;H01L21/027 主分类号 G03F7/037
代理机构 代理人
主权项
地址