ADSORPTION PAD FOR POLISHING AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an adsorption pad for polishing capable of favorably adsorbing a polishing object in polishing and capable of easily connecting and disconnecting the polishing object after polishing and to provide its manufacturing method.

SOLUTION: The adsorption pad 11 for polishing has a film of a foam body higher in density than the inside on an adsorptive surface 21 by using one surface of a plate type body 19 made of a polyurethane foam body having a continuous pore structure as the adsorptive surface 21 of an LCD glass 14 being the polishing object and water repellency by a water repellency giving agent on a surface of the film. Additionally, the adsorption pad 11 for polishing is constituted so that the LCD glass 14 is adsorbed to a surface of the adsorption pad 11 for polishing in polishing and the LCD glass 14 is connected and disconnected to and from the adsorption pad 11 for polishing after polishing. It is favorable that a contact angle to the adsorptive surface 21 of the adsorption pad 11 for polishing is 95 to 115°.

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