Composition for titanium nitride hard mask and etch residue removal

摘要

Aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing etch residue are low pH aqueous composition comprising solvent, a weakly coordinating anion, amine, and at least two non-oxidizing trace metal ions. The aqueous compositions contain no non-ambient oxidizer, and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. Systems and processes use the aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing titanium nitride (TiN or TiNxOy) etch residue.

主权项

1. An aqueous composition for selectively removing titanium nitride (TiN or TiNxOy) from a semiconductor device comprising Cu, W, low-k dielectric material and the titanium nitride,comprising:
a weakly coordinating anion having negative charge highly dispersed throughout its structure; an amine salt buffer; at least two non-oxidizing trace metal ions and the remaining is solvent selected from the group consisting of water, glycol, propylene glycol, lactic acid, acetic acid, sulfolanes, dimethyl sulfoxide, alkyl sulfone, and combinations thereof; wherein the aqueous composition (1) contains no non-ambient oxidizer; (2) is exposed to air, and (3) has a pH less than 7.