| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film which has an excellent antireflection characteristic for a wide incident-angle light, and achieves an excellent optical performance especially by reducing a reflectance of s-polarized light, to provide an optical system and an exposure apparatus which have the antireflection film, and to provide a manufacturing method of device, having a process where the exposure apparatus is used. <P>SOLUTION: The antireflection film which is applied on a substrate and prevents light reflection consists of only such a material that reflectance Rs of s-polarized light satisfies Rs<1.5% in the incident angle range of the light 0°to 65°, average reflectance Ra of s-polarized light and p-polarized light satisfies Ra<1.2% in the incident angle range of the light 0°to 55°, the reflectance Rs of s-polarized light and reflectance Rp of p-polarized light satisfies Rp>Rs in the incident angle range of the light 55°to 70°, the reflectance Rs of s-polarized light satisfies Rs<3% at the incident angle of the light 67°, refractive index for wavelength of the light is 1.35 to 2.2 and extinction coefficient is 3×10<SP>-4</SP>or less. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
