Stress isolated detector element and microbolometer detector incorporating same

摘要

A detector element for a microbolometer detector includes a platform structure spaced apart from a substrate. The platform structure has a peripheral region surrounding a central region. First and second contacts are located at the peripheral region proximate opposing first and third edges of the peripheral region. A stiff beam structure extends across the central region between the first and second contacts, and at least one sensor is located at the peripheral region proximate at least one of second and fourth edges of the peripheral region. An optically absorptive material structure of a grid pattern of first and second material portions may be located at the central region. First material portions perpendicular to the beam structure may connect to the beam structure and to inner edges of the peripheral region, and none of the second material portions extend continuously between and couples to opposing inner edges of the peripheral region.

主权项

1. A detector element for a microbolometer detector comprising:
a platform structure spaced apart from a substrate, said platform structure having a central region and a peripheral region surrounding said central region, said peripheral region being circumscribed by a first edge, a second edge, a third edge, and a fourth edge, said first and third edges opposing one another, said second and fourth edges opposing one another; a first contact located at said peripheral region of said platform structure proximate said first edge; a second contact located at said peripheral region proximate said third edge; a beam structure extending across said central region between said first and second contacts; and at least one sensor located at said peripheral region proximate at least one of said second and fourth edges.