| 摘要 |
A method for manufacturing a light guide plate ( 70 ) includes: providing a first substrate ( 30 ); coating a photo-resist ( 600 ) on the first substrate; exposing the photo-resist using a photo mask; developing the photo-resist; anisotropically dry etching the first substrate; removing remaining photo-resist ( 640 ), thereby providing a mold ( 40 ); providing a second substrate ( 50 ) and a hot-embossing machine ( 80 ), and conducting hot-embossing of the second substrate using the mold and the hot-embossing machine, thereby providing the light guide plate. By using the above-described dry etching and hot-embossing methods, a pattern of the photo mask is precisely transferred to the first substrate and the light guide plate. A diameter of the each of micro-dots formed on the light guide plate is as little as 10 nanometers. Thus a uniformity of luminance and color provided by the entire light guide plate is improved.
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