CARRIER HEAD HAVING SUBSTRATE DETECTING MECHANISM FOR MECHANICAL-CHEMICAL POLISHING DEVICE

摘要

PROBLEM TO BE SOLVED: To securely detect the existence of a substrate in a carrier head and to operate a device without exposing the inside of the carrier head to the contamination by a slurry. SOLUTION: This carrier head 100 for a mechanical-chemical polishing device 20 includes a substrate detecting mechanism. The carrier head 10 includes a base 22 and a flexible member which is connected to the base 22, and partitions a chamber. The lower surface of the flexible member provides a substrate receiving surface. The substrate detecting mechanism includes a sensor to measure the pressure of the chamber and to display the output signal to display the result; and a processor composed to display whether the substrate is installed to the substrate receiving surface or not, according to the output signal.