| 摘要 |
A method of providing unbalanced voltages to a bipolar electrostatic chuck of a substrate processing chamber. The method includes providing a variable balanced voltage power supply, which is configured for producing, responsive to a control signal, balanced differential output voltages on a first and second terminals of the variable balanced voltage power supply. The method further includes coupling the first terminal of the variable balanced voltage power supply to a first node. The first node is coupled to a first resistive element of a resistor bridge. The method also includes coupling the second terminal of the variable balanced voltage power supply to a second node. The second node is coupled to a second resistive element of the resistor bridge. The first resistive element is lower in resistance value than the second resistive element. There is further included coupling the first resistive element and the second resistive element to a common reference terminal, thereby producing, without employing a power supply other than the variable balanced voltage power supply, the unbalanced voltages at the first node and the second node when the variable balanced voltage power supply is turned on. |
