发明名称 |
Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
摘要 |
A projection exposure apparatus includes a projection optical system, which is arranged in an optical path between a first surface and a second surface, projects a pattern on a negative plate arranged on the first surface onto a workpiece arranged on the second surface and exposes the pattern thereon. The projection optical system includes a first imaging optical subsystem having a dioptric imaging optical system; a second imaging optical subsystem having a concave reflecting system; a third imaging optical subsystem having a dioptric imaging optical system; a first folding mirror arranged in an optical path between the first imaging optical subsystem and the second imaging optical subsystem; and a second folding mirror arranged in an optical path between the second imaging optical subsystem and the third imaging optical subsystem. The first imaging optical subsystem forms a first intermediate image and the second imaging optical subsystem forms a second intermediate image.
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申请公布号 |
US7301605(B2) |
申请公布日期 |
2007.11.27 |
申请号 |
US20010769832 |
申请日期 |
2001.01.26 |
申请人 |
NIKON CORPORATION |
发明人 |
OMURA YASUHIRO;SHIRAISHI NAOMASA;OWA SOICHI |
分类号 |
G03B27/54;G02B13/24;G02B17/08;G03B27/70;G03F7/20 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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