发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the breakdown voltage in a semiconductor device including a bipolar transistor. SOLUTION: In the semiconductor device 100 including the bipolar transistor, a base region has a two layer structure including a first base region 114, and a second base region 116 which is provided around the first base region 114 and has a lower impurity density than that of the first base region 114 and has a shallower depth than that of the first base region 114. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009004763(A) 申请公布日期 2009.01.08
申请号 JP20080129646 申请日期 2008.05.16
申请人 NEC ELECTRONICS CORP 发明人 FUJII HIROMOTO
分类号 H01L21/331;H01L21/8222;H01L21/8248;H01L21/8249;H01L27/06;H01L29/732 主分类号 H01L21/331
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